Author:
Chandrachood Madhavi,Grimbergen Michael,Yu Keven,Leung Toi,Tran Jeffrey,Chen Jeff,Bivens Darin,Yalamanchili Rao,Wistrom Richard,Faure Tom,Bartlau Peter,Crawford Shaun,Sakamoto Yoshifumi
Reference4 articles.
1. Overcoming Mask Etch Challenges for 45 nm & Beyond;Chandrachood,2008
2. Characterization of a New Polarity Switching Negative Tone E-beam Resist for 14nm and 10nm Logic Node Mask Fabrication and Beyond;Faure,2014
3. Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyond;Kushida,2007
4. In situ selectivity monitor for dry etch of photomasks;Zhou,2009