Array imaging system for lithography
Author:
Affiliation:
1. SUSS MicroOptics SA (Switzerland)
2. SUSS MicroTec Photonic Systems Inc. (United States)
3. Ecole Polytechnique Fédérale de Lausanne (Switzerland)
Publisher
SPIE
Reference19 articles.
1. Voelkel, R.: Wafer-scale micro-optics fabrication. Advanced Optical Technologies, 1(3), 135–150 (2012)
2. Miniaturized imaging systems;Voelkel,2003
3. Lohmann, A. W.: Scaling laws for lens systems. Applied Optics, 28(23), 4996–4998 (1989)
4. Application of gradient-index fiber arrays to copying machines
5. Imaging and radiometric properties of microlens arrays
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1. Leveraging wafer-level manufacturing process limitations to increase large-scale fused silica microlens array uniformity;Optical Modeling and System Alignment;2019-08-30
2. Improvements on the uniformity of large-area microlens arrays in Fused Silica;Optics Express;2019-02-20
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