Author:
Wei Alexander C.,Hughes Gregory P.,Chalekian Aaron J.,Mackey Lawrence N.,Mikkelson Andrew R.,Engelstad Roxann L.
Cited by
2 articles.
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1. 193-nm immersion photomask image placement in exposure tools;SPIE Proceedings;2006-03-10
2. Bibliography (1994–2004) of other topics;Modelling and Simulation in Materials Science and Engineering;2004-12-08