Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) for application in science and technology

Author:

Bartnik Andrzej,Wachulak Przemysław,Jarocki Roman,Kostecki Jerzy,Szczurek Mirosław,Adjei Daniel,Ahad Inam Ul,Ayele Mesfin G.,Fok Tomasz,Szczurek Anna,Torrisi Alfio,Węgrzyński Łukasz,Fiedorowicz Henryk

Publisher

SPIE

Reference99 articles.

1. Optical Systems for Soft X Rays

2. Turcu, I.C.E. and Dance, J. B., [X-rays from laser plasmas: Generation and applications], Wiley, 263–303 (1998).

3. Attwood, D.T., [Soft X-rays and Extreme Ultraviolet Radiation: Principles and Applications], Cambridge University Press, 365–408 (1999).

4. Bakshi, V., [EUV Sources for Lithography], SPIE Press Book, 957–991 (2006).

5. Enhanced X-ray emission in the 1-keV range from a laser-irradiated gas puff target produced using the double-nozzle setup

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