Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform
Author:
Publisher
SPIE-Intl Soc Optical Eng
Subject
General Engineering,Atomic and Molecular Physics, and Optics
Reference17 articles.
1. Synthetic approach to designing optical alignment systems
2. Nanometer scattered-light alignment system using SiC x-ray masks with low optical transparency
3. A new interferometric alignment technique
4. Optical alignment system for submicron x‐ray lithography
5. An alignment system for synchrotron radiation x-ray lithography
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