1. Combinatorial overlay control for double patterning
2. Multi Layer Overlay Measurement Recent Developments;Amira,2013
3. Advanced Modeling Strategies to Improve Overlay Control for 32nm Lithography Processes;Minvielle,2009
4. Automated optimized overlay sampling for high-order processing in double patterning lithography;Koay,2010
5. Overlay Target Design and Evaluation for SADP Process;Yeh,2012