Structural design of a new class of acetal polymer for DUV resists-Reference-Cited by-同舟云学术

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Structural design of a new class of acetal polymer for DUV resists

Published:2000-06-23 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Technology and Processing XVII
language:
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Author:

Fujimori Toru,Tan Shiro,Aoai Toshiaki,Nishiyama Fumiyuki,Yamanaka Tsukasa,Momota Makoto,Kanna Shinichi,Kawabe Yasumasa,Yagihara Morio,Kokubo Tadayoshi,Malik Sanjay,Ferreira Lawrence

Publisher

SPIE

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development and Application of Microelectronic Photoresist;PROG CHEM;2014

2. Novel polymeric nonionic photoacid generators and corresponding polymer Langmuir–Blodgett (LB) films for photopatterning;Journal of Photochemistry and Photobiology A: Chemistry;2011-03

3. Effect of resist polymer molecular weight on EUV lithography;Advances in Resist Materials and Processing Technology XXVI;2009-03-13

4. Resolution and LWR improvements by acid diffusion control in EUV lithography;Advances in Resist Materials and Processing Technology XXVI;2009-03-13

5. A Resist Material Study for LWR and Resolution Improvement in EUV Lithography;Journal of Photopolymer Science and Technology;2008

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