1. Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process;Lai,2009
2. Improved modeling performance with an adapted vectorial formulation of the hopkins imaging equation;Adam,2003
3. Resolution Enhancement Techniques in Optical Lithography
4. TCAD development for lithography resolution enhancement
5. Optical Imaging in Projection Lithography;Wong,2005