1. Erratum to “Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring” [Thin Solid Films 455–456 (2004) 828–836]
2. Novel diffraction-based spectroscopic method for overlay metrology;Yang,2003
3. Optical Fourier transform scatterometry for LER and LWR metrology;Boher,2005
4. Applications of angular scatterometry for the measurement of multiply periodic features;Raymond,2003
5. Metrology of deep trench etched memory structures using 3D scatterometry;Reinig,2005