1. 2D measurement using CD SEM for arbitrarily shaped patterns;Lee,2007
2. Tradeoff between lithographic performance and mask cost of masks made by inverse lithography technology;Kim,2009
3. An optimized OPC and MDP flow for reducing mask write time and mask cost;Yang,2010
4. Generalization of shot definition for variable shaped e-beam machines for write time reduction;Sahouria,2010
5. Mask data correction methodology in the context of model-based fracturing and advanced mask models;Pierrat,2011