Author:
Shi-Li Xiang,Jun Liu,Hao Linpo,Shao Chuanyu
Reference5 articles.
1. Advanced Micro-Lithography Process for i-line Lithography
2. 2020 17th China International Forum on Solid State Lighting & 2020 International Forum on Wide Bandgap Semiconductors China (SSLChina: IFWS)
3. 0.1/spl mu/m level contact hole pattern formation with KrF lithography by resolution enhancement lithography assisted by chemical shrink (RELACS);Toyoshima,1998
4. Advanced RELACS Technology for ArF Resist
5. Advanced Micro-Lithography Process with Chemical Shrink Technology;Ishibashi;Japanese Journal of Applied Physics,2001