Simulating use of displacement Talbot lithography for high volume AR waveguide manufacturing-Reference-Cited by-同舟云学术

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Simulating use of displacement Talbot lithography for high volume AR waveguide manufacturing

Published:2024-04-10 Issue: Volume:12751 Page:38
ISSN:
Container-title:DTCO and Computational Patterning III
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Author:

Wooley Kelsey,Chalony Maryvonne,Dawes Andrew,Wang Zhixin,Solak Harun H.,Melvin Lawrence

Publisher

SPIE

Reference7 articles.

1. LXXVI. Facts relating to optical science. No. IV

2. Talbot effect beyond the paraxial limit at optical frequencies

3. Displacement Talbot lithography process simulation analysis;Dawes;Photomask Technology,2023

4. Computer modeling of LED light pipe systems for uniform display illumination

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1. Metalens manufacturing complexities and costs;Advanced Etch Technology and Process Integration for Nanopatterning XIII;2024-04-09

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