1. Evaluation of a new generation, photomask develop system for CAR;Cantrell,2004
2. Application of a wafer development process to mask making;Lee,2005
3. Improving global CD uniformity by optimizing post-exposure bake and develop sequences;Osborne,2003
4. Process optimization for thin resists for advanced e-beam reticle fabrication;Kobayashi,1996
5. Determination of spatial CD signatures on photo-masks;Utzny,2006