Accurate lithography simulation model based on convolutional neural networks-Reference-Cited by-同舟云学术

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Accurate lithography simulation model based on convolutional neural networks

Published:2017-07-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Watanabe Yuki¹,Kimura Taiki¹,Matsunawa Tetsuaki¹,Nojima Shigeki¹

Affiliation:

1. Toshiba Memory Corp. (Japan)

Publisher

SPIE

Reference9 articles.

1. Fast sparse aerial-image calculation for OPC;Cobb,1995

2. Evaluation of Lithography Simulation Model Accuracy for Hotspot-based Mask Quality Assurance;Satake,2007

3. Universal process modeling with VTRE for OPC;Granik,2002

4. A new fast resist model: the Gaussian LPM;Mack,2011

5. Neural Network based approach to resist modeling and OPC;Zach,2004

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