Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks-Reference-Cited by-同舟云学术

Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks

Published:2016-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography VII
language:
Short-container-title:

Author:

Wood Obert¹,Wong Keith¹,Parks Valentin¹,Kearney Patrick²,Meyer-Ilse Julia³,Luong Vu⁴,Philipsen Vicky⁴,Faheem Mohammad¹,Liang Yifan¹,Kumar Ajay¹,Chen Esther¹,Bennett Corbin⁵,Fu Bianzhu¹,Gribelyuk Michael¹,Zhao Wayne¹,Mangat Pawitter¹,Van der Heide Paul¹

Affiliation:

1. GLOBALFOUNDRIES Inc. (United States)

2. SEMATECH Inc. (United States)

3. Lawrence Berkeley National Lab. (United States)

4. IMEC (Belgium)

5. GLOBALFOUNDRIES Inc. (United States)

Publisher

SPIE

Reference14 articles.

1. Impact of mask stack on high NA EUV imaging,;Philipsen,2012

2. Interaction of 3D mask effects and NA in EUV lithography,;Neumann,2012

3. NXE:3300 insertion for N7 : status and challenges,;Philipsen,2015

4. High-performance multilayer mirrors for soft x-ray projection lithography,;Stearns,1992

5. Interface imperfections in metal/Si multilayers

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