Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry-Reference-Cited by-同舟云学术

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Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry

Published:2023-04-28 Issue: Volume: Page:
ISSN:
Container-title:Optical and EUV Nanolithography XXXVI
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Author:

Dorney Kevin,Kissoon Nicola N.,Holzmeier Fabian,Larsen Esben W.,Singh Dhirendra P.,Arvind Shikhar,Santra Sayantani,Fallica Roberto,Makhotkin Igor,Philipsen Vicky,De Gendt Stefan,Fleischmann Claudia,van der Heide Paul A. W.,Petersen John S.

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-07-12

2. Actinic photoemission spectroscopy of litho materials using a table-top ultrafast EUV source;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

3. Patterning Infrastructure Development for Advanced EUV Lithography: Continuing Dimensional Scaling Through EUV Lithography to Support Moore’s Law;IEEE Electron Devices Magazine;2024-03

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