Near-ultraviolet absorption annealing in hafnium oxide thin films subjected to continuous-wave laser radiation
Author:
Affiliation:
1. University of Rochester, Laboratory for Laser Energetics, 250 East River Road, Rochester, New York 14623-1299
2. Cornell University, Department of Materials Science and Engineering, Ithaca, New York 14853-1501
Publisher
SPIE-Intl Soc Optical Eng
Subject
General Engineering,Atomic and Molecular Physics, and Optics
Reference12 articles.
1. Localized absorption effects during 351 nm, pulsed laser irradiation of dielectric multilayer thin films
2. Near-ultraviolet absorption and nanosecond-pulse-laser damage in HfO2 monolayers studied by submicrometer-resolution photothermal heterodyne imaging and atomic force microscopy
3. Effects of thermal annealing on ion-beam-sputtered SiO 2 and TiO 2 optical thin films
4. Microstructure and laser-induced damage threshold of ZrO2 coatings dependence on annealing temperature
5. Photothermal heterodyne imaging of individual metallic nanoparticles: Theory versus experiment
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