Author:
De Silva Anuja,Mignot Yann,Meli Luciana,Xu Yongan,Seshadri Indira,Felix Nelson M.,Zeng Wilson,Cao Yong,Dai Huixiong,Ngai Christopher S.,Stolfi Michael,Diehl Daniel,Phan Khoi,DeVries Scott
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1 articles.
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1. EUV single exposure via patterning at aggressive pitch;Extreme Ultraviolet (EUV) Lithography XII;2021-02-24