1. Solution for high-order distortion on extreme illumination condition using computational prediction method;Kang,2015
2. CD-SEM distortion quantification for EPE metrology and contour analysis;Dillen,2017
3. Eliminating the offset between overlay metrology and device patterns using computational metrology target design;Zhou,2016
4. Diffraction-based overlay for spacer patterning and double patterning technology;Lee,2011
5. Computational scanner wafer mark alignment;Menchtchikov,2017