Automatic classification and accurate size measurement of blank mask defects-Reference-Cited by-同舟云学术

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Automatic classification and accurate size measurement of blank mask defects

Published:2015-07-09 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
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Author:

Bhamidipati Samir,Paninjath Sankaranarayanan,Pereira Mark,Buck Peter

Publisher

SPIE

Reference5 articles.

1. Automatic Classification of Blank Substrate Defects;Boettiger,2014

2. Key issues in Automatic Classification of Defects in post-Inspection Review Process of Photomasks;Pereira,2012

3. Digital Image Processing;Gonzalez,2008

4. EUV mask defect mitigation through pattern placement;Burns,2010

5. EUV mask-blank defect avoidance solutions assessment;Elayat,2012

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Automated Defect Detection and Decision-Support in Gas Turbine Blade Inspection;Aerospace;2021-01-26

2. Defect avoidance for EUV photomask readiness at the 7 nm node;SPIE Proceedings;2016-05-10

3. Viability of pattern shift for defect-free extreme ultraviolet lithography photomasks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-02-02

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