High Resolution, High Precision I-Line Stepper Processing
Author:
Affiliation:
1. Hitachi Ltd. (Japan)
Publisher
SPIE
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. ARCOR, a new photolithography technique with antireflective coating on resist;Polymer Engineering and Science;1992-10
2. A New Photolithography Technique with Antireflective Coating on Resist: ARCOR;Journal of The Electrochemical Society;1990-12-01
3. A new method for reflectivity measurement at the interface between resist and substrate;Journal of Applied Physics;1990-03
4. New Water‐Soluble Contrast Enhancing Material for I‐Line Lithography;Journal of The Electrochemical Society;1989-02-01
5. Excimer laser lithography using contrast enhancing material;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1988-03
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