Dissolution nonlinearity tail degradation with decreased reaction events impacts EUV stochastic defect generations-Reference-Cited by-同舟云学术

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Dissolution nonlinearity tail degradation with decreased reaction events impacts EUV stochastic defect generations

Published:2020-09-20 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet Lithography 2020
language:
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Author:

Fukuda Hiroshi

Publisher

SPIE

Reference11 articles.

1. Stochastic effects in EUV lithography: random, local CD variability, and printing failures;De Bisschop;J. Micro/Nanolith. MEMS MOEMS,2017

2. Stochastic printing failures in EUV lithography;De Bisschop,2019

3. Shot Noise, LER and Quantum Efficiency of EUV Photoresists;Brainard,2004

4. Analysis of Line Edge Roughness Using Probability Process Model for Chemically Amplified Resists

5. Stochastic exposure kinetics of extreme ultraviolet photoresists: simulation study

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Stochastic hotspots in extreme ultraviolet exposed nano-patterns as correlated molecular sub-cluster formation probabilities;Journal of Applied Physics;2023-06-15

2. Stochasticity in extreme-ultraviolet lithography predicted by principal component analysis of Monte Carlo simulated event distributions in resist films;Journal of Applied Physics;2022-08-14

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