Topology-oriented pattern extraction and classification for synthesizing lithography test patterns

Author:

Shim Seongbo1,Shin Youngsoo2

Affiliation:

1. Korea Advanced Institute of Science and Technology, Department of Electrical Engineering, 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, Republic of KoreabSamsung Electronics, San #16, Banwol-dong, Hwasung 445-701, Republic of Korea

2. Korea Advanced Institute of Science and Technology, Department of Electrical Engineering, 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, Republic of Korea

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 18 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Advanced pattern defect detection and analysis with artificial intelligence;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

2. Test pattern generation by optimization of the feature space signature;38th European Mask and Lithography Conference (EMLC 2023);2023-10-05

3. Generic lithography modeling with dual-band optics-inspired neural networks;Proceedings of the 59th ACM/IEEE Design Automation Conference;2022-07-10

4. Deep learning hotspots detection with generative adversarial network-based data augmentation;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-06-09

5. Hotspot detection in large-scale layout with proposal sampling and feature parameters optimization;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-11-22

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