Author:
Abe Tsukasa,Amano Tsuyoshi,Mohri Hiroshi,Hayashi Naoya,Tanaka Yuusuke,Kumasaka Fumiaki,Nishiyama Iwao
Cited by
4 articles.
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1. Residual-type mask defect printability for extreme ultraviolet lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-11
2. Study of EUV mask defect repair using FIB method;SPIE Proceedings;2010-09-30
3. FIB-CVD technology for EUV mask repair;SPIE Proceedings;2010-04-29
4. Evaluation of defect repair of EUVL mask pattern using FIB-GAE method;SPIE Proceedings;2008-05-30