Investigation of cross-field wavefront aberrations of KrF lithography exposure systems as a function of excimer laser bandwidth-Reference-Cited by-同舟云学术

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Investigation of cross-field wavefront aberrations of KrF lithography exposure systems as a function of excimer laser bandwidth

Published:2001-09-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Lalovic Ivan,Kroyan Armen,Farrar Nigel R.,Taitano Dennis,Zambon Paolo,Smith Adlai H.

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Laser bandwidth and other sources of focus blur in lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2006-10-01

2. Laser bandwidth and other sources of focus blur in lithography;SPIE Proceedings;2006-03-10

3. Illumination spectral width impacts on mask error enhancement factor and iso-dense bias in 0.6-NA KrF imaging;21st Annual BACUS Symposium on Photomask Technology;2002-03-11

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