Writing time estimation of EB mask writer EBM-9000 for hp16nm/logic11nm node generation-Reference-Cited by-同舟云学术

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Writing time estimation of EB mask writer EBM-9000 for hp16nm/logic11nm node generation

Published:2014-10-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Kamikubo Takashi,Takekoshi Hidekazu,Ogasawara Munehiro,Yamada Hirokazu,Hattori Kiyoshi

Publisher

SPIE

Reference14 articles.

1. International technology roadmap for semiconductors (ITRS) 2013, http://www.itrs.net/

2. Accurate models for EUV lithography;Hendrickx,2009

3. Mask Process Correction (MPC) modeling and its application to EUV mask for Electron beam mask writer, EBM-7000;Kamikubo,2010

4. Entering Mask Process Correction era for EUV mask manufacturing;Burgel,2013

5. A novel mask proximity correction software combining accuracy and reduced writing time for the manufacturing of advanced photomasks;Schiavone,2012

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recent progress and future of electron multi-beam mask writer;Japanese Journal of Applied Physics;2023-02-17

2. Multibeam mask writer MBM-1000;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-09-24

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