Nikon F2 exposure tool development-Reference-Cited by-同舟云学术

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Nikon F2 exposure tool development

Published:2003-06-25 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Owa Soichi,Matsumoto Yukako,Ohmura Yasuhiro,Sakuma Shigeru,Aoki Takashi,Nishikawa Jin,Nagasaka Hiroyuki,Mizutani Takeyuki,Shiraishi Naomasa,Kido Kazuhiro,Tanaka Issei,Nagatsuka Jun

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Oriented growth of large size calcium fluoride single crystals for optical lithography;Journal of Crystal Growth;2005-07

2. 157-nm lithography with extremely high numerical aperture lens for 45-nm technology node;SPIE Proceedings;2004-05-28

3. Theoretical analysis of 157-nm hard pellicle system purification via a cyclic purge/fill process;Journal of Micro/Nanolithography, MEMS, and MOEMS;2004-01-01

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