1. Impact of 14-nm photomask uncertainties on computational lithography solutions
2. Modeling metrology for calibration of OPC models;Mack,2016
3. Advanced Mask Process Modeling for 45-nm and 32-nm Nodes;Tejnil,2008
4. A fully model-based MPC solution including VSB shot dose assignment and shape correction Ingo Bork;Buck,2015
5. Accurate mask model implementation in OPC model for 14nm nodes and beyondNacer Zine El Abidine;Sundermann,2015