High throughput and dense sampling metrology for process control-Reference-Cited by-同舟云学术

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High throughput and dense sampling metrology for process control

Published:2017-03-28 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Sun Lei¹,Kohyama Tsunehito²,Takeda Kuniaki²,Nozawa Hiroto²,Asakawa Yuji³,Kagalwala Taher¹,Lobb Granger¹,Mont Frank¹,Dai Xintuo¹,Pal Shyam¹,Wang Wenhui¹,Kye Jongwook¹,Goodwin Francis¹

Affiliation:

1. GLOBALFOUNDRIES Inc. (United States)

2. Lasertec Corp. (Japan)

3. Lasertec USA Inc. (United States)

Publisher

SPIE

Reference4 articles.

1. Solving next generation (1x node) metrology challenges using advanced CDSEM capabilities: tilt, high energy and backscatter imaging;Zhang,2015

2. Line edge roughness frequency analysis for SAQP process;Sun,2016

3. Comparison of left and right side line-edge roughness in lithography;Sun,2016

4. Directed self-assembly aware restricted design rule and its impact on design ability;Chen,2016

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Connective tissue disease-–associated interstitial lung disease: an underreported cause of interstitial lung disease in Sub-Saharan Africa;Clinical Rheumatology;2020-08-15

2. Effect of partial coherence on dimensional measurement sensitivity for DUV scatterfield imaging microscopy;Optics Express;2019-10-02

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