Design space analysis of novel interconnect constructs for 22nm FDX technology

Author:

Guha Neogi Tuhin1,Jain Navneet1,Verma Piyush1,Permana David1,Lutich Andrey2,Weishbuch Francois2,Wehella-Gamage Deepal1,Ramadout Benoit Francois Claude3,Vangara Gowtham1,Kim Juhan1,Herrmann Thomas3,Sun Kai1,Babich Katherina1,Pritchard David4,Rashed Mahbub4

Affiliation:

1. GLOBALFOUNDRIES Inc. (United States)

2. GLOBALFOUNDRIES Dresden Module Two, GmbH & Co. KG (Germany)

3. GLOBALFOUNDRIES Dresden Module One LLC & Co. KG (Germany)

4. GLOBALFOUNDRIES Inc. (Germany)

Publisher

SPIE

Reference10 articles.

1. Semiconductor devices formed on a continuous active region with an isolating conductive structure positioned between such semiconductor devices, and methods of making same;Rashed,2013

2. Lithography-simulation-based design for manufacturability rule development: an integrated circuit design house’s approach

3. Toward a Methodology for Manufacturability-Driven Design Rule Exploration;Capodieci,2004

4. A Framework for Early and Systematic Evaluation of Design Rules;Ghaida,2009

5. Design-of-experiments based design rule optimization

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