Origin and distribution of redeposition layer in polished fused silica-Reference-Cited by-同舟云学术

Origin and distribution of redeposition layer in polished fused silica

Published:2015-08-07 Issue:8 Volume:54 Page:085102
ISSN:0091-3286
Container-title:Optical Engineering
language:en
Short-container-title:Opt. Eng

Author:

Wang Zhuo¹,Wang Lin²,Peng WenQiang³,Cao YuJun¹,Yang JunHong¹,Tang Li¹,Li ShengYi¹

Affiliation:

1. National University of Defense Technology, College of Mechatronic Engineering and Automation, Deya Road, Changsha 410073, China

2. Anhui University, School of Life Science, Jiulong Road, Hefei 230601, China

3. National University of Defense Technology, College of Mechatronic Engineering and Automation, Deya Road, Changsha 410073, ChinacNational University of Defense Technology, College of Basic Education, Deya Road, Changsha 410073, China

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Engineering,Atomic and Molecular Physics, and Optics

Reference48 articles.

1. Concerning the impact of polishing induced contamination of fused silica optics on the laser-induced damage density at 351nm

2. Investigation of laser-induced damage by various initiators on the subsurface of fused silica

3. All-fiber quasi-continuous wave supercontinuum generation in single-mode high-nonlinear fiber pumped by submicrosecond pulse with low peak power

4. Investigation of nanoprecursors threshold distribution in laser-damage testing

5. HF-Based Etching Processes for Improving Laser Damage Resistance of Fused Silica Optical Surfaces

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2. Investigation on morphology and chemistry of the Beilby layer on polished fused silica;Ceramics International;2023-06

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4. Assessing the quality of polished brittle optical crystal using quasi-Brewster angle technique;Precision Engineering;2021-11

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