Optimization of laser-damage resistance of evaporated hafnia films at 351nm-Reference-Cited by-同舟云学术

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Optimization of laser-damage resistance of evaporated hafnia films at 351nm

Published:2008-10-08 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Laser-Induced Damage in Optical Materials: 2008
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Author:

Oliver J. B.,Papernov S.,Schmid A. W.,Lambropoulos J. C.

Publisher

SPIE

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Round-robin measurements of the laser-induced damage threshold with sub-picosecond pulses on optical single layers;Optical Engineering;2020-11-21

2. Origin and effect of film sub-stoichiometry on ultraviolet, ns-laser damage resistance of hafnia single layers;Optical Materials Express;2020-03-13

3. Large-aperture coatings for fusion-class laser systems;Applied Optics;2019-11-15

4. Optical properties of oxygen vacancies in HfO2 thin films studied by absorption and luminescence spectroscopy;Optics Express;2018-06-21

5. Effects of optical design modifications on thermal performance of a highly reflective HfO2/SiO2/TiO2 three material coating;Heat and Mass Transfer;2017-08-28

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