-Reference-Cited by-同舟云学术

Mass-limited laser-plasma cryogenic target for 13-nm point x-ray sources for lithography

Author:

Jin Feng,Gabel Kai,Richardson Martin C.,Kado Masataka,Vasil'ev Andrew F.,Salzmann Daniel

Publisher

SPIE

Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. An Abundance of Extremely Large Clusters as a Target for Intense Laser-Matter Interaction;Journal of Cluster Science;2022-03-07

2. Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development;Journal of Physics B: Atomic, Molecular and Optical Physics;2015-05-28

3. Stabilized droplet target delivery for high power EUV generation for lithography;LEOS 2007 - IEEE Lasers and Electro-Optics Society Annual Meeting Conference Proceedings;2007-10

4. Characterization of the tin-doped droplet laser plasma EUVL sources for HVM;SPIE Proceedings;2007-03-16

5. Tin inventory for HVM EUVL sources;SPIE Proceedings;2007-03-16

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