High temperature spin on carbon materials with excellent planarization and CVD compatibility-Reference-Cited by-同舟云学术

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High temperature spin on carbon materials with excellent planarization and CVD compatibility

Published:2019-03-25 Issue: Volume: Page:
ISSN:
Container-title:Advances in Patterning Materials and Processes XXXVI
language:
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Author:

Zhang Keren,Cui Li,Yamada Shintaro,Cameron James F.,Wong Sabrina,Chen Lawrence,Coley Suzanne M.,Greene Dan,Kaitz Joshua A.,Ke Iou-Sheng,Popere Bhooshan,LaBeaume Paul,Foltz Benjamin,Zhang Lei,Kearns Kenneth,Ngunjiri Johnpeter

Publisher

SPIE

Reference18 articles.

1. 193-nm multilayer imaging systems;Meador,2003

2. The development of an SC1 removable si-anti-reflective-coating;Yamada,2018

3. Comparison of single-, bi-, and tri-layer resist process;Nishimura,2005

4. Organic underlayer materials with exceptionally high thermal stability;Cheon,2009

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ultra-high carbon fullerene-based spin-on-carbon hardmasks;Advances in Patterning Materials and Processes XL;2023-05-01

2. Development of Spin-on Carbon Materials with High Planarization Performance for Multilayer Resist Process;2020 IEEE International Interconnect Technology Conference (IITC);2020-10-05

3. Development of low blaze angle gratings for ALS-U;Advances in X-Ray/EUV Optics and Components XV;2020-08-21

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