Optimization of sub-100-nm designs for mask cost reduction-Reference-Cited by-同舟云学术

Optimization of sub-100-nm designs for mask cost reduction

Published:2004-04-01 Issue:2 Volume:3 Page:322
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Balasinski Artur

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. U. Behringer, Foreword, Proceedings of the European Mask Conference, 2003, p. 1.

2. K. Kimmel, in Ref. 2, pp. 225–230.

3. International Technology Roadmap for Semiconductors, 2002 update (Semiconductor Industry Association, San Jose, CA, 2002).

4. L. Karklin, “Simulation study of the 193 nm lithography: An evaluation of subwavelength photomasks using Monte Carlo simulation,” Proceedings of Photomask Japan, 2002, p. 103.

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