A new model of haze generation and storage-life-time estimation for mask-Reference-Cited by-同舟云学术

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A new model of haze generation and storage-life-time estimation for mask

Published:2006-10-06 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Shimada S.,Kanda N.,Takahashi N.,Nakajima H.,Tanaka H.,Ishii H.,Shoji Y.,Otsuki M.,Naito A.,Hayashi N.

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fuzzy Few-Shot Learning for Predictive Maintenance and Cost-Benefit Analysis in Semiconductor Manufacturing: A Case Study on Photomask Haze;IEEE Access;2024

2. Co-adsorption of NH3 and SO2 on quartz(0 0 0 1): Formation of a stabilized complex;Chemical Physics Letters;2011-08

3. Study of the airborne SO 2 and NH 3 contamination on Cr, MoSi, and quartz surfaces of photomasks;SPIE Proceedings;2010-09-30

4. Theoretical study of mask haze formation;SPIE Proceedings;2008-04-22

5. Photomask cleaning process improvement to minimize ArF haze;SPIE Proceedings;2008-04-22

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