Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography-Reference-Cited by-同舟云学术

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Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography

Published:2016-10-31 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Lin Dakui¹,Chen Huoyao¹,Kroker Stefanie²,Käsebier Thomas²,Liu Zhengkun¹,Qiu Keqiang¹,Liu Ying¹,Kley Ernst-Bernhard²,Xu Xiangdong¹,Hong Yilin¹,Fu Shaojun¹

Affiliation:

1. Univ. of Science and Technology of China (China)

2. Friedrich-Schiller-Univ. Jena (Germany)

Publisher

SPIE

Reference4 articles.

1. Design of multi-area grating for soft x-ray flat-field spectrograph

2. High‐resolution duo‐multichannel soft x‐ray spectrometer for tokamak plasma diagnostics

3. Comparison of mechanically ruled versus holographically varied line-spacing gratings for a soft-x-ray flat-field spectrograph

4. Novel method to fabricate corrugation for a λ/4‐shifted distributed feedback laser using a grating photomask

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