Author:
Ivin Vladimir V.,Larin Dmitry Y.,Lucas Kevin D.,Makhviladze Tariel M.,Rogov Andrew A.,Verzunov Sergey V.
Cited by
5 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Analysis of OPC optical model accuracy with detailed scanner information;Optical Microlithography XXI;2008-03-14
2. Gate etch process model for static random access memory bit cell and FinFET construction;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2006
3. The impact of mask topography on CD control;Optical Microlithography XVIII;2005-05-12
4. Critical dimension control in optical lithography;Microelectronic Engineering;2003-09
5. Lithography;Nano and Giga Challenges in Microelectronics;2003