Angle position monitoring technology of micro-mirror array for freeform illumination module in immersion lithography

Author:

Ma Xiaozhe,Zhang Fang,Huang Huijie,Zeng Zongshun,Zhu Siyu,Zeng Aijun

Publisher

SPIE

Reference11 articles.

1. Scanner matching for standard and freeform illumination shapes using FlexRay;Bekaert,2011

2. Freeform illumination sources: an experimental study of source-mask optimization for 22-nm SRAM cells;Bekaert,2010

3. Successful implementation of a MEMS micromirror array in a lithography illumination system;Endendijk,2013

4. Reducing aberration effect of Fourier transform lens by modifying Fourier spectrum of diffractive optical element in beam shaping optical system

5. An approach to increase efficiency of DOE based pupil shaping technique for off-axis illumination in optical lithography

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