Communication theory in optical lithography

Author:

Rieger Michael L.

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 17 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Investigating Machine Learning Applications for FDSOI MOS-Based Computer-Aided Design;2023 9th International Conference on Signal Processing and Communication (ICSC);2023-12-21

2. Informatics-based computational lithography for phase-shifting mask optimization;Optics Express;2022-05-31

3. Efficient informatics-based source and mask optimization for optical lithography;Applied Optics;2021-09-13

4. Moore’s Law revisited through Intel chip density;PLOS ONE;2021-08-18

5. Reliability Challenges in FinFETs;Mitigating Process Variability and Soft Errors at Circuit-Level for FinFETs;2021

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