In-situ measurements of VUV optical materials for F2 laser-Reference-Cited by-同舟云学术

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In-situ measurements of VUV optical materials for F2 laser

Published:2002-07-15 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Sumitani Akira,Itakura Yasuo,Yoshida Fumika,Kawasa Youichi,Zhang Jing,Kanda Noriyoshi,Itani Toshiro

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Evaluation systems of F 2 laser lithography materials;SPIE Proceedings;2004-05-28

2. Evaluation of outgassing from a fluorinated resist for 157-nm lithography;SPIE Proceedings;2004-05-14

3. Evaluation of outgassing from a fluorinated resist for 157 nm lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2004

4. Development of organic bottom antireflective coating for 157-nm lithography;SPIE Proceedings;2003-06-25

5. Study of resist outgassing by F 2 laser irradiation;Advances in Resist Technology and Processing XX;2003-06-11

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