Author:
Conti Giuseppina,Perin Martins Henrique,Cordova Isvar A.,Ma Jonathan,Wojtecki Rudy J.,Naulleau Patrick P.,Nemsak Slavomir
Reference11 articles.
1. Study of resist hardmask interaction through surface activation layers;De Silva,2018
2. Some future perspectives in soft- and hard- X-ray photoemission
3. Wojtecki R. J., De Silva E. A., Arellano N., Nathel N. F.F., “EUV-patterning of Monolayers for selective atomic layer depositing”, Patent Pub. No.: US 2019/0391494 Al, 12/26/2019
4. Engineering resist-substrate interface: a quantum chemistry study of self-assembled monolayers;Ma,2020
5. Concentration and chemical-state profiles at heterogeneous interfaces with sub-nm accuracy from standing-wave ambient-pressure photoemission