Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)-Reference-Cited by-同舟云学术

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Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)

Published:2003-06-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Oshino Tetsuya,Shiraishi Masayuki,Kandaka Noriaki,Sugisaki Katsumi,Kondo Hiroyuki,Ota Kazuya,Mashima K.,Murakami Katsuhiko,Oizumi Hiroaki,Nishiyama Iwao,Okazaki Shinji

Publisher

SPIE

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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3. Manufacturing of diffraction-quality optical elements for high-resolution optical systems;SPIE Proceedings;2009-10-23

4. Manufacturing and investigation of objective lens for ultrahigh resolution lithography facilities;SPIE Proceedings;2008-03-03

5. Development of New Negative-tone Molecular Resists Based on Calixarene for EUV Lithography;Journal of Photopolymer Science and Technology;2008

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