Performance of improved e-beam lithography system JBX-9000MVII
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SPIE
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Characterization for the photomask fabrication based on a high-resolution technique with a non-chemically amplified resist and a post-exposure bake;Microelectronic Engineering;2016-04
2. Fabricating a high-resolution mask with improved line-edge roughness by using a nonchemically amplified resist and a postexposure bake;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2015-11
3. Extending analog design scaling to sub-wavelength lithography: co-optimization of RET and photomasks;SPIE Proceedings;2011-03-17
4. Measurements of Variable-Shaped Electron Beams with Solid-State Detector and Scattering Aperture;Japanese Journal of Applied Physics;2007-09-20
5. E-Beam Mask Writers;Handbook of Photomask Manufacturing Technology;2005-04-07
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