Elimination of overexposed area and its phase correction method in speckle pattern interferometry
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Published:2022-01-07
Issue:06
Volume:61
Page:
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ISSN:0091-3286
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Container-title:Optical Engineering
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language:
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Short-container-title:Opt. Eng.
Author:
Wang Yonghong1,
Wu Shuangle1,
Yao Yanfeng1,
Li Chen1,
Yan Peizheng1
Affiliation:
1. Hefei University of Technology, School of Instrument Science and Opto-Electronics Engineering, Hefei
Publisher
SPIE-Intl Soc Optical Eng
Subject
General Engineering,Atomic and Molecular Physics, and Optics