Small pitch overlay imaging metrology targets for tight OPO control-Reference-Cited by-同舟云学术

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Small pitch overlay imaging metrology targets for tight OPO control

Published:2024-04-10 Issue: Volume:11325 Page:72
ISSN:
Container-title:Metrology, Inspection, and Process Control XXXVIII
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Author:

Roy Nikhil Aditya Kumar,Housley Richard,Manampurathu Suresh,Reddy Ranga,Engelhard Dan,Wang Hao,Miyafuji Atsushi,Nishiyama Toshiharu,Feler Yoel,Shaphirov Diana,Ghinovker Mark,Ashuah Ido,Grauer Yoav,Li Yonglei

Publisher

SPIE

Reference10 articles.

1. On product overlay metrology challenges in advanced nodes;Shchegrov,2020

2. Optical overlay metrology trends in advanced nodes;Katz,2022

3. Moiré effect-based Overlay target design for OPO improvements;Van den,2021

4. OPO reduction by novel target design;Liu,2020

5. Overlay stability control in IBO measurement using rAIM target;Park,2022

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