Software-based data path for raster-scanned multi-beam mask lithography
Author:
Affiliation:
1. Mentor Graphics (India) Pvt. Ltd. (India)
2. Mentor Graphics Corp. (United States)
3. Applied Materials, Inc. (United States)
Publisher
SPIE
Reference5 articles.
1. Matt Malloy, “2013 mask industry survey,” Proc. SPIE 8880 Photomask Technology 2013, 88800K (September 20, 2013).
2. Michael J. Bohan, Henry Chris Hamaker, and Warren Montgomery, “Implementation and characterization of a DUV raster-scanned mask pattern generation system,” Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, 16 (March 11, 2002).
3. Gary A. Burns and James A. Schoeffel, “Performance Evaluation of the Ateq Core-2000 Scanning Laser Reticle Writer,” Proc. SPIE 0772, Optical Microlithography VI, 269 (January 1, 1987).
4. Brian J. Grenon, D. C. Defibaugh, Donna M. Sprout, Chris Hamaker and Peter D. Buck, “Technical performance of the ALTA-3000 laser writer,” Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, 50 (December 7, 1994).
5. S. Schulze, E. Sahouria, R. Todd, L. Grodd, and M. Finch, “Parallel processing approaches in RET and MDP - New hybrid multithreading and distributed technology for optimum throughput in a hierarchical flow,” Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, 151 (December 15, 2003).
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