Photomask manufacturability and pattern fidelity for curvilinear structures

Author:

Gladhill Richard,Nakagawa Kent H.

Publisher

SPIE

Reference15 articles.

1. McCord, M. A. and Rooks, M. J., [SPIE Handbook of Microlithography, Micromachining and Microfabrication, Vol. 1: Microlithography], SPIE Optical Engineering Press, Bellingham, Washington, 2.9 Appendix: GDSII Steam Format (1997)

2. SEMI P39-0416, “Specification for OASIS® - Open Artwork System Interchange Standard”, SEMI® International Standards, Milpitas, California, (2016)

3. Autodesk, Inc., “AutoCAD 2012 DXF Reference”, http://images.autodesk.com/adsk/files/autocad_2012_pdf_dxf-reference_enu.pdf (2011)

4. Weast, R.C. editor, [CRC Handbook of Chemistry and Physics, 59th Edition], CRC Press, Inc., Boca Raton, FL, F-250 (1979)

5. The 2014 CODATA recommended values of the fundamental physical constants;Mohr,2015

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1. Mask synthesis for silicon photonics devices;Integrated Photonics Platforms II;2022-05-26

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