1. SEMI P37-1102: Specification for extreme ultraviolet lithography mask substrates
2. Ultra-low roughness magneto-rheological finishing for EUV mask substrates
3. Alternative smoothing techniques to mitigate EUV substrate defectivity;House,2012
4. Magnetorheological finishing (MRF) in commercial precision optics manufacturing;Golini,1999
5. High precision polishing of EUV photoblanks with magneto-rheological finishing (MRF);Tricard,2002