E-beam to complement optical lithography for 1D layouts
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SPIE
Cited by 17 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Provably Good Max–Min- $m$ -Neighbor-TSP-Based Subfield Scheduling for Electron-Beam Photomask Fabrication;IEEE Transactions on Very Large Scale Integration (VLSI) Systems;2018-02
2. Cut Redistribution With Directed-Self-Assembly Templates for Advanced 1-D Gridded Layouts;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2017-12
3. Resolution Enhancement Techniques and Mask Data Preparation;Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology;2016-04-14
4. Double-Patterning Aware DSA Template Guided Cut Redistribution for Advanced 1-D Gridded Designs;Proceedings of the 2016 on International Symposium on Physical Design;2016-04-03
5. Cut-hole layout decomposition and synthesis to reduce the effect of edge-placement errors;Microelectronic Engineering;2016-04
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